Facilities

The company OLA display Corp. has a laboratory for microfabrication and characterization in a class 1000 and class 100 cleanrooms. Certain equipements are used to provide R&D services to universities as well as companies. The list is presented below:

 

Perkin-Elmer model 4410 sputtering system

up to seven 4.5"x4.5" samples at the same time / 3 different targets
RF mode: 8" diameter circular target
DC or pulsed-DC mode : delta-shaped target

Applied Materials model AMP-3300 Plasma II PECVD system

up to fourteen 4" diam. substrates at the same time
Ar, N2, O2, SiH4... for deposition and O2, CF4 for etching

 

SemiGroup model 1000 TP reactive ion etching (RIE) system

Etching, cleaning or surface modification
Up to 650 W (~1.3 W/cm²)
Currently used gases: Ar, O2, CF4, SF6

 

Thermco Products Minibrute tube furnaces (2)

Temperature up to 1400 °C (the temperature has been calibrated)
Not possible to use vacuum with these furnaces, but it is possible to add gases
Currently used gases: H2:N2, N2, O2

Karl Suss MA56 mask aligner

Semiproduction mask alignment and exposure system
Up to 4.5"x4.5" substrates

 

 

Wedge bonder, Tencor profilometer, Waveform generator, ILV Characterization, etc... For more information, please contact us at info@oladisplay.com